Thermophysical properties of refractory W-50.4%Re and Mo-39.5%Re thin alloy layers deposited on silicon and silica substrates
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چکیده
منابع مشابه
Ohmic Contact of Cu/Mo and Cu/Ti Thin Layers on Multi-Crystalline Silicon Substrates
Cu-Mo and Cu-Ti contact structures were fabricated on multi-crystalline silicon substrates to provide a low resistance ohmic contact. Deposition steps are done in an excellent vacuum chamber by means of electron beam evaporation and samples are then annealed for the realization of an efficient alloy layer. The effects of process parameters such as film thickness, annealing duration and temp...
متن کاملohmic contact of cu/mo and cu/ti thin layers on multi-crystalline silicon substrates
cu-mo and cu-ti contact structures were fabricated on multi-crystalline silicon substrates to provide a low resistance ohmic contact. deposition steps are done in an excellent vacuum chamber by means of electron beam evaporation and samples are then annealed for the realization of an efficient alloy layer. the effects of process parameters such as film thickness, annealing duration and temperat...
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چکیده ندارد.
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ژورنال
عنوان ژورنال: International Journal of Refractory Metals and Hard Materials
سال: 2020
ISSN: 0263-4368
DOI: 10.1016/j.ijrmhm.2019.105147